Device and method for separating metals and/or metal alloys from metallo-organic electrolytes

ABSTRACT

The invention relates to a device ( 1 ) for separating metals and/or metal alloys from metallo-organic electrolytes and depositing the same on products ( 7 ), said device comprising at least one coating section ( 3 ) for coating the products ( 7 ), at least one other treatment section ( 2,4 ), and at least one lock chamber ( 20,40 ) for introducing and discharging the products ( 7 ) into and out of the device ( 1 ) essentially without permeation of oxygen and/or humidity. The inventive device is provided with at least one siphon rinsing unit ( 60,61 ) comprising a separating element ( 53,54 ) for the gas-related separation of the other sections ( 2,4 ) of the device from the coating section ( 3 ), or for sealing said other sections ( 2,4 ) in relation to the coating section ( 3 ), and at least one hood part ( 5 ) that can be flooded with an inert gas and tightly surrounds essentially the coating section ( 3 ), the at least one siphon rinsing unit ( 60,61 ), and the at least one other treatment section ( 2,4 ). The invention also relates to a corresponding method whereby products ( 7 ) are introduced into the device in such a way that there is essentially no solvent loss, said products are delivered to at least one coating section ( 3 ) essentially in a gas-tight manner, they are then coated, and delivered to at least one output section ( 4 ) essentially in an gas-tight manner, and the finished products ( 7 ) are discharged. An inert-gas atmosphere cap is provided over all of the sections ( 50,51,52 ) of the inventive device.

The invention relates to a device and process for depositing metalsand/or metal alloys from metal-organic electrolytes, in particularmetal-organic complex salts in organic solvents, onto products andhaving at least one coating section for coating the products, at leastone additional processing section, and at least one sluice chamber forsluicing the products into and out of the device essentially withoutoxygen and/or moisture penetrating.

A galvanic deposition of aluminum, magnesium, and their alloys fromaqueous systems, as is customary in classical galvanotechnology, is notpossible due to the very low potential of these elements. Although inthe past decades there have been numerous approaches to depositingaluminum, magnesium, and their alloys from non-aqueous systems, onlydeposition from complexes containing aluminum or magnesium alkyls weresuccessful on the industrial scale. Therein, electrolyte variants withcorrespondingly suitable process control and analytics have been usedfor the most varied applications with more or less success. In severalcases large-scale industrial application has become possible therewith.

The metal alkyls used in the production of the individual electrolytevariants react, as is known, very vigorously with oxygen and water toform reaction products, such as, for example, alkoxy compounds oraluminum oxanes. These reaction products are no longer in the positionto form additional complexes with the alkali metals or alkali halidesused in the electrolyte formulas. They remain behind as solublecontaminants in the electrolyte and in so doing reduce its electricalconductivity. Likewise, the maximum usable current density is reducedwith increasing concentration of these reaction products, whereby thecoating process loses its cost-effectiveness and, in given cases, itsgood quality.

The aforementioned constellation of problems has already beeninvestigated in a study at the Georg Simon Ohm Technical Institute inNuremberg in 1987, with the result that the penetration of oxygen and/ormoisture into a coating system in which there are alkyl-basedmetal-organic electrolytes should be largely avoided in order to ensurea long service lifetime of the electrolytes and optimal layer quality.Independently of the chemical or electrochemical disadvantages caused bythe penetration of oxygen and water into the coating system, avoidingthe penetration of oxygen and/or water into the coating system is alsomarkedly important with regard to the reliable and safe operation ofsuch a system, above all in regard to reliability in processing andsafety in production and with regard to the environment.

In the state of the art various coating systems are known which alsoinclude in part approaches for avoiding the penetration of oxygen and/ormoisture into parts of the coating system. Such a system, in which anelectrolytic coating of metallic or non-metallic endless products withmetals or alloys from aprotic water and oxygen-free electrolytes isprovided in a continuous process, is described in DE 197 16 493 C2. Forthis purpose rinsing and drying processes are attached, which areintended to remove the residues of aqueous solutions. In addition tothis, exiting of the coated endless products from the system via asluice system is provided. The sluice chamber comprises a centralchamber with a sealing liquid which represents a barrier for the aircontained in an outer chamber. A third chamber contains an inert gas. Inaddition to this, regeneration circuits are provided in which all theliquids used in the processes are prepared, cleaned, and recycled.

From DE 30 23 827 C2, sealed to the outside, a tubular cell is knownthrough which the material which is to be treated and which is contactedby cathodes can be moved in the axial direction, in particularcontinuously, along anodes. In order to prevent the undesired escape ofthe electrolyte from the tubular cell as well as to prevent thepenetration of an air atmosphere into it, the tubular cell can bepressurized with a protective gas. According to this publication asluice arrangement consisting of several chambers is also provided intowhich inert gas and/or an inert liquid can be introduced for mutualsealing of the individual chambers.

According to DE 199 32 524 C1, for the purpose of an electrochemicaltreatment, in particular for electrochemical coating of parts which areconductive or made conductive, these parts are brought into a containerfilled with electrolyte solution or into a rotating basket which isrotated during the treatment and thus coats all around the parts. Thecontainer is sealed gas-tight. The treatment of the parts in the basketis done without any reloading. The respective liquids or solutions aremerely pumped into the container and out of it once again. For drying,the container is centrifuged each time and in so doing the residues ofthe electrolyte solution are centrifuged off by propelling the basket.Due to its design this system is not suitable for depositingmetal-organic electrolytes.

Also From DE 41 18 416 A1 a device for coating parts, which arepreferably relatively thin, is known, in which device a coating is doneby bringing the parts into containers disposed so as to be adjacent toone another. In so doing, the containers or baths are in an inert gasatmosphere. In addition to this, a rinsing bath, an etching bath, and adepositing bath are provided. In arranging the various baths in a commoncontainer, sluices formed as partitions are provided which can bepenetrated by the parts to be treated. For this, the penetrablepartition is formed in a penetration area by a pair of rollers which aremade of an elastic material, rotate around an axis, run against oneanother in such a manner that a tight seal is formed, and slide oppositethe bordering walls of the container in such a manner that a tight sealis formed.

From these aforementioned publications devices only follow which attemptto avoid any penetration of oxygen or moisture into the device inpartial areas of the respective devices. For this, merely parts of thedevices are provided with, for example, rinsing and drying devices or athree-part sluice chamber.

The objective of the present invention is thus to provide a device and aprocess for depositing metals and/or metal alloys from metal-organicelectrolytes in which safety-related problems no longer occur, and anyemission of solvent from the device, and in particular any reaction ofelectrolyte systems used with oxygen and moisture from the ambientatmosphere of the device, can be avoided, essentially completely.

The objective is realized in a device according to the preamble of claim1 by the fact that at least one siphon rinsing device with a separatingdevice for gas-related separation of the other sections of the devicefrom, or sealing of, these other sections with respect to the coatingsection and at least one hood component which can be flooded with inertgas and essentially tightly encloses the coating section, the at leastone siphon rinsing device, and the at least one additional coatingsection are provided. For a process according to the preamble of claim17 the objective is realized by the fact that an essentially solventloss-free sluicing of the products through at least one sluice chamberinto a device for depositing metals and/or metal alloys is provided, theproducts are transferred to at least one coating section essentiallyexcluding gas, the products are coated in the at least one coatingsection, the coated products are transferred from the coating section toat least one output section essentially excluding gas via at least onesiphon rinsing device, and the finished products are sluiced out via atleast one additional sluice chamber, where an inert gas atmosphere bellis held up over all the sections of the device. Extensions of theinvention are defined in the subordinate claims.

Thereby a device and a process for depositing metals and/or metal alloysare provided with which it is possible to reduce any carry-over ofoxygen and water or moisture as well as other contaminants into thecoating electrolyte in so far as possible. Thereby a long servicelifetime of the coating electrolyte can be ensured. The formation ofundesired reaction products, like solvent emissions, can be very sharplyrestricted or essentially completely prevented. A diffusion barrier foroxygen and moisture between these individual sections of the device isprovided precisely by providing siphon rinsing devices with a separatingdevice for separating the gas atmosphere into individual sections of thedevice and for sealing these individual sections of the device relativeto one another. The gas atmosphere in the essentially tightly sealedhood component which encircles the individual sections of the device canbe set so as to be optimal in each section of the device. Thereby it isalso possible to prevent any migration of solvent into the electrolytearea via the gas atmosphere. Since it frequently happens that thecoating electrolyte is chemically incompatible with cleaning fluids orother solvents, this separation of the gas atmospheres of the individualsections of the device has proven itself particularly advantageous.Thereby a safe and reliable operation of the system is possible. For onething, by providing an essentially tightly sealing hood component anencapsulation of the entire atmosphere within the device, and thus aseparation from the exterior atmosphere which surrounds the device, ispossible. Thereby evaporating solvent can be collected before its exitfrom the device and recycled into the corresponding parts of the system.Contamination of the ambient air around the device can thus beessentially eliminated. For another thing, it is possible within thehood component to maintain a constant pressure which is at the same timedifferent from that which would correspond to the pressure in theambient atmosphere. Preferably, at least in a part of the individualsections of the hood component a slight overpressure with respect to theatmosphere which surrounds the device is maintained and monitored.Preferably, at least one pressure maintenance device for maintaining aconstant pressure in the hood component and/or a slight overpressure inthe hood component with respect to the outer and/or ambient atmosphereis provided. Unintentional penetration of the exterior atmosphere intothe device and thus any contamination of the gas atmosphere within thedevice can thus be essentially avoided.

In order to be able to maintain an essentially constant pressure in thehood component, in particular in the individual hood sections, thereforein particular a slight overpressure with respect to the exterioratmosphere of the device, preferably at least one gas buffer device isprovided and is connected, or can be connected, to it/them, inparticular in the first and/or last section. Gas buffer devices of thistype are thus preferably provided at the entrance and exit of the devicesince there variations in pressure can occur due to the sluicing in andsluicing out of the products. The gas buffer devices are filled if anoverpressure outside of a preselectable tolerance occurs in the hoodcomponent and emptied if an underpressure outside of a preselectabletolerance occurs in the hood component, e.g. if gas atmosphere iswithdrawn from the respective hood component as, for example, forflooding a sluice chamber with inert gas.

Preferably, at least one oxygen monitoring device is provided in the atleast one sluice chamber and/or the sections of the hood component.Preferably, at least one device for monitoring the solvent concentrationis also provided in the sluice chamber(s). Thereby it is possible toconstantly monitor the oxygen and/or solvent content of the gasatmosphere in the individual sections of the device. Since the sluicechamber(s) serve to prevent the introduction of air or oxygen into thedevice, the oxygen content of the sluice chamber atmosphere is regularlymonitored after the sluicing in of the products, the draining of the airintroduced with the product in so doing, and the rinsing of the chamberwith, for example, inert gas. If the sluice chamber is opened to thehood component, the oxygen content within the chamber should be as closeto zero as possible so that any penetration of oxygen into the hoodcomponent as well as the other parts of the device can be avoided. Thedischarge of solvent from the device should also be reduced to as closeto zero as possible. In order to be able to monitor the solvent contentin the sluice chambers, which represent a connection of the device tothe exterior atmosphere, devices for monitoring the solventconcentration are also provided there. To the extent that the oxygenand/or solvent content exceed(s) a threshold value which can bepredetermined and/or set, or is set, it is possible to trigger anadaptation of the pumping times to the introduction of gas into anddischarge of gas from the sluice chamber and/or an additional rinsingphase with an inert gas during pumping cycles to reduce the oxygencontent in the at least one sluice chamber. For example, a longerpumping cycle for pumping out the contaminated gas atmosphere isprovided. Also the inert gas atmosphere bell can be monitored withregard to its oxygen content, where the oxygen content should be asclose to zero as possible. Through these measures it can be ensured inan optimal manner that the inert gas atmosphere bell of the device iscontaminated with oxygen to hardly any degree, or not at all, whereoptimal coating results and a very high safety and reliability duringthe treatment of the products can be achieved.

Preferably, a cleaning and/or activation section for cleaning and/orpre-treating the surface of the products and/or at least one outputsection for sluicing the products out of the device are provided.Preferably, the at least one cleaning and/or activation sectioncomprises one or more sealable treatment basins with a cleaning fluidfor cleaning the products to be coated and/or an activation fluid foractivating their surfaces or for producing an adhesion promoter layer.In such a cleaning and/or activation section cleaning of the rawproducts is advantageously possible, where an oxide-free and blanksurface of the products can be produced. Thereby an optimal adhesivestrength for the following coating can be ensured. In order to improvethis adhesive strength still further, an adhesion promoter layer canadvantageously be applied to the surface of the product in this sectionof the device. By providing sealable treatment basins it is possible toopen them selectively when a respective product is supposed to beinserted into them. Undesired evaporation of treatment fluid into thehood atmosphere can thus be further suppressed.

Preferably, the at least one cleaning and/or activation sectioncomprises at least one rinsing device disposed after the at least onetreatment basin(s) for rinsing the pretreated products and preventingany carry-over of chemicals from the cleaning and/or activation section.Precisely when providing a siphon rinsing device following the cleaningand/or activation section, therefore before the coating section, is itlogical to provide such a rinsing of the pretreated products in order toprevent any carry-over of the chemicals from the cleaning and/oractivation section into the siphon rinsing device and thus subsequentlyinto the coating electrolyte. Preferably, a solvent preparation and/orregeneration device is provided and connected to such a rinsing device.The cleaned solvent is in particular once again recycled into thissiphon rinsing device, while the cleaned cleaning fluid or activationfluid or other fluid in the treatment basins disposed before this stagecan be recycled into these treatment basins. For cleaning, distillationand subsequently storage of the cleaned solvent is provided.

Preferably, the at least one solvent preparation and/or regenerationdevice for the cleaning and/or activation section is provided in thebypass to it. Thereby a constant cleaning of the solvent and theelectrolyte or other cleaning and bath fluids during the coating, oreven during the pre-cleaning and also the subsequent treatment section,is possible.

Preferably, the at least one sluice chamber is also connected, or can beconnected, to a solvent separation and recycling device and/or a gasoscillation system. Preferably, at least one sluice chamber is providedat the entrance of the cleaning and/or activation section and/or atleast one sluice chamber is provided at the exit of the output section.Preferably, in the sluicing-in step the products are introduced into theat least one sluice chamber. In so doing, the sluice chamber is filledwith the exterior atmosphere, sealed, and subsequently evacuated,therefore the exterior atmosphere is conveyed out of the chamber and itis subsequently flooded with inert gas. Thereafter in the sluicing-instep the products are introduced into a first treatment section of thedevice. In the sluicing-out step from the device these products arebrought out of the hood atmosphere and into the sluice chamber, it issealed, and the hood atmosphere pumped out of it and recycled into thehood section. The sluice chamber can subsequently be opened and theproducts taken out. Thereafter the sluice chamber is sealed once again,the penetrating exterior atmosphere drained, and the chamber floodedwith inert gas. Particularly preferably, the pumped-out sluiceatmosphere is prepared, where dry inert gas and cleaned solvent arerecycled into the process, in particular dry inert gas into the inertgas atmosphere bell and cleaned solvent into a treatment basin. The gasoscillation system therefore includes the pumping of dry inert gas intothe hood atmosphere after pumping the atmosphere of the sluice chamberout of the sluice chamber.

Therefore, since exterior atmosphere is brought in with the product tobe coated during the sluicing into the sluice chamber preferablyprovided at the entrance to the device before the coating, and sinceafter the products are coated they are once again brought out into theexterior atmosphere with the opening of a sluice chamber provided at theend of the device and penetration of exterior atmosphere into the sluicechamber, it has proven itself advantageous to provide a solventseparation and recycling device in the area of the sluice chamber.Precisely there, during sluicing in and sluicing out of the products,oxygen as well as moisture can penetrate into the device and evaporatedsolvent can escape from the device. Via preferably provided coolingdevices, atmosphere pumped out of the sluice chamber and contaminatedwith solvent can thus be cooled and the solvent separated, collected,and recycled. In the solvent separation process the pumped-out gas isdried and can subsequently be recycled once again into the hoodatmosphere. Through the solvent separation in the sluicing-out area theproducts can be cleaned of the solvent residues adhering to them andleave the device essentially completely dry so that solvent emissionsessentially can no longer take place. Also, in the area of the sluicingout of the products, the solvent residues discharged during thepumping-out process are recondensed, collected, and subsequentlyrecycled into the process, in particular into the last siphon rinsingdevice.

Preferably, the inert gas atmosphere bell is also cleaned, in particularby condensing the inert gas atmosphere and recycling the condensed-offsolvent portions into their respective circuits, in particular treatmentbasins. Preferably, a cooling device with a condensate separation deviceis provided for the recovery of carried-over and/or evaporated solventresidues, in particular in the hood component and/or coating sectionand/or connected to the at least one sluicing chamber. Particularlypreferably, the one or more cooling devices in the hood sections and/orin the hood component comprise solvent recycling devices for recyclingsolvents into treatment and/or coating basins and/or the at least onesiphon rinsing device. Thereby it is also possible to remove solventcontaminants from the gas atmosphere in the hood component once again.The portions of solvent condensed into the cooling devices cansubsequently be recycled into corresponding treatment basins of therespective hood section. Preferably, the respective cooling devices areprovided in the individual hood sections since the evaporating liquidsare usually each different in the individual hood sections so that thecontaminants in the gas atmosphere are always different. Thus, recyclingis advantageously done within the respective hood section.

Preferably, the at least one coating section comprises at least onecoating basin which can be sealed to prevent uncontrolled evaporation ofsolvent into the hood component. In particular, at least one coolingdevice for condensing evaporated solvent and at least one collectiondevice for collecting the condensed solvent are also provided in the gasspace of the at least one coating basin. In addition to this, the atleast one coating section can comprise at least one output rinsingdevice. After the coating process the products are put into the rinsebath provided in the output rinsing device in order to remove adheringelectrolyte residues. To clean the rinsing bath recycling of cleanedsolvent from the solvent separation and/or regeneration device isprovided in particular.

Since the siphon rinsing device is provided for separating theindividual sections of the device, therefore in particular of thecleaning and/or activation section, of the treatment section, and of theoutput section, it has proven itself advantageous to provide anessentially non-reactive solvent in these transition areas. The at leastone siphon rinsing device is thus preferably filled with an inertsolvent. Thereby undesired chemical reactions between mutuallyincompatible chemicals from the individual sections of the device can beessentially avoided. Preferably, the at least one siphon rinsing devicecomprises a sealable double rinsing device with a mounted partitionwhich is oriented so that hood sections lying above are divided. Byproviding such a partition, which dips into the rinsing bath of thesiphon device, a gas-tight separation of different hood sections of thedevice can be provided. In order to make possible the transport ofproducts through the siphon rinsing device, specifically since aparticular preferred transport device provided within the hood sectionscannot penetrate the partition, in particular at least one transportdevice is disposed, or can be disposed, within the double rinsing devicefor traversing the products below the partition so that during thefilling of the double rinsing device with a rinsing fluid the transportdevice is positioned below the level of the fluid. Thereby a completeimmersion of the products into the rinsing fluid is ensured, wherebythey can be rinsed all around and cleaned with the preferably inertrinsing fluid in order to avoid any carry-over of chemicals and/or gasatmosphere from a forward section into the following section of thedevice.

Preferably, in addition to this, at least one electrolyte/solventseparating device is provided in the area of the coating section. Inparticular the electrolyte/solvent separating device(s) comprise(s) adistillation device for distilling solvent from the electrolyte/solventbath fluid drained from the at least one coating basin. In addition tothis, devices for recycling the resulting clean solvent into the outputrinsing basin and/or devices for recycling the electrolytes into theelectrolyte circuit are provided.

Cleaning of the electrolyte solution, therefore of the coating solution,can thus be done in the bypass of the coating section. This cleaningdevice follows in particular the coating baths, where in particularclean solvent is recycled into the output rinsing basins disposed afterthe coating baths, and in particular electrolyte into the coating baths.

Electrolyte fluid and/or solvents are preferably conducted essentiallyin closed circuits. Thereby any contamination of the other baths of thedevice is essentially avoided. Advantageously, there is cleaning orpreparation of electrolyte fluid and/or solvent and/or a rinsing fluidto avoid any carry-over of chemicals. To avoid any carry-over ofelectrolyte fluid adhering to the products and/or cleaning fluid and/oractivation fluid, rinsings in the various rinsing devices are preferablyprovided in addition. These rinsing devices can be provided at variouspoints of the device and of the coating process, in particular in theoutput area of the respective sections of the device.

Above all, products of any form can be coated with the devices accordingto the invention, therefore also products having back-cuts in whichsolvent can collect. Such collections cannot be removed with devicesfrom the state of the art, on account of which a solvent coat cannot bereliably avoided with them. With the process according to the inventionand the device according to the invention removal of solvent residuesfor products of any form is possible in a reliable manner.

For more detailed explanation of the invention an embodiment example isdescribed in more detail with the aid of the drawing. It shows acomprehensive view of a device according to the invention for depositingmetals.

The figure shows a schematic diagram as a comprehensive view of a device1 for depositing metals and/or metal alloys. The device comprises acleaning and/or activation section 2, a coating section 3, and an outputsection 4. In addition to this, it has a hood component 5 whichessentially tightly encloses all three aforementioned parts. The hoodcomponent is subdivided into three sections 50, 51 52. The three hoodsections are separated from one another by respective partitions 53, 54.

The cleaning and/or activation section 2 comprises a first sluicechamber 20, a first treatment basin 21, a second treatment basin 22, anda rinsing basin 23. In addition to this, the cleaning and/or activationsection comprises a part of a first siphon rinsing device 60. The siphonrinsing device 60 is divided by the partition 53 into two parts so thatit forms a double rinsing device, which is accessible from section 2 andsection 3 but otherwise forms a diffusion barrier. All basins or rinsingdevices can be sealed with individual covers 24, 25, 26, 27, 62. Thesluice chamber 20 comprises a sluice door 28 which makes possible therunning of products into the sluice chamber. Preferably, such productsare run into the sluice chamber via a transport carriage, which is notrepresented in the diagram.

The sluice chamber 20 is connected to a device 70 for the recovery ofsolvent and a gas oscillation system 80. The device for recovery of thesolvent has a cold trap 71, a valve 72, a condensate separation device73, as well as a line 74 between the valve 72 and the sluice chamber 20,a line 75 between the cold trap 71 and the condensate separation device73, and a solvent recycling line 76 between the condensate separationdevice 73 and the first treatment basin 21.

The gas oscillation system 80 comprises a vacuum pump 81 three valves82, 83, 84, and a line 85 between the sluice chamber 20 and the firstvalve 82, an additional line 86 between the valve 82 and the vacuum pump81, a line 87 between the vacuum pump 81 and the valve 83 in therecycling line to the hood component as well as an additional line 88between the valve 83 and the hood component 50. The line 87 also leadsto the valve 84 and from it an additional line 89 leads outwards intothe exterior atmosphere. Through this, air can be blown out of thedevice.

In addition to this, a solvent preparation and/or regeneration device 90is connected to the cleaning and/or activation section 2. The solventpreparation and/or regeneration device comprises a distillation device91 and a condensate collecting tank 92. The distillation device is fedvia a line 93 which comes from the rinsing basin 23. Between thedistillation device 91 and the condensate collecting tank 92, a line 94is also provided. The cleaning fluid cleaned in the distillation device91 is recycled via a line 95, a pump 96, and an additional line 97 intothe second treatment basin 22. Clean solvent distilled off by thedistillation device can be pumped back from the condensate collectingtank 92 to the rinsing basin 23 via a line 98, a pump 99, and a line100.

Between the rinsing basin 23 and the second treatment basin 22 anoverflow line 29 is provided in addition to this in order, if necessary,to avoid an overflow of the rinsing basin in case an excess amount ofsolvent is recycled.

The excess solvent is then recycled into the second treatment basin 22via the overflow line 29.

In addition to this, the hood section 50 of the cleaning and/oractivation section 2 comprises a transport device 55 for traversingproducts 7 between the individual treatment, rinsing, and other basins.For this, the transport device comprises a transport carriage 56 whichis provided in the embodiment with a hook 57 for suspending the products7 to be coated. Here the hook 57 can be traversed fastened on thetransport carriage 56 so that the products on this hook can be slowlylowered into their respective baths and can be lifted out of them.

In addition to this, the hood section 50 comprises a cooling device 58.It is represented in the figure in the form of a cooling coil. Via thiscooling coil evaporated solvent can be condensed and collected in acollecting device 59 also provided in the hood section 50. In the figurethe collecting device is represented in the form of a collecting trough.The solvent collected in the collecting trough or collecting device 59can be recycled to the first coating basin 21 via a drain line 101. Thusthere can be a recycling of solvent into the first as well as into thesecond coating basin. In principle, still more coating basins can alsobe provided but the figure here merely reproduces one possibleembodiment. It is also possible to provide several rinsing basins.Likewise, it would be possible in principle to provide more than onesluice chamber.

In order to be able to maintain a uniform pressure within the hoodsection 50, despite cleaning of the gases in this hood section anddespite recycling of cleaned gases, a gas buffer container 120 isprovided outside of the hood component 5.

The gas buffer container 120 is connected to the interior of the hoodsection 50 via a line 121. Via this line 121 there is a bilateralexchange of gas between the gas buffer container and the hood section50. Thereby it is possible to maintain a preset overpressure and aboveall a constant pressure within the hood section.

To check the oxygen and solvent content in the cleaning and/oractivation section 2 one provides a first oxygen sensor 122 in the areaof the hood section 50 as well as a second oxygen sensor 123 and asolvent concentration sensor 124 at the sluice chamber 20. All thesensors can be connected to a monitoring and control device (not shownin the figure) in order to monitor an overshoot of the set thresholdvalues and, if necessary, to selectively adapt pumping cycles of thesluice chamber and an exchange of gases.

The coating section 3 comprises the second part of the siphon rinsingdevice 60 which, as mentioned above, is formed as a double rinsingdevice. For the transport of the products brought through the cover 62into the siphon rinsing device 60, within the siphon rinsing device 60 atransport device 66 is provided which can comprise in particular atransport carriage, as is represented in the figure. After the transportthrough the siphon rinsing device the products can be taken out onceagain on the side of the coating section 3 through the cover 63 of thesiphon rinsing device 60. The coating section 3 comprises two coatingbasins 30, 31 as well as an output rinsing basin 32 and a first part ofan additional siphon rinsing device 61. Each of these basins is providedwith covers 33, 34, 35 while the siphon rinsing device is provided withthe cover 64 on the side of the coating section. In the gas space belowthe covers 33, 34 of the two coating basins 30, 31 cooling coils 36, 37and collecting troughs 38, 39 are each provided in order to condensesolvent which evaporates from the electrolyte during the coating and, inparticular after the coating basins, to conduct it into the rinsing bath32.

Also, the coating section 3 is provided with a cleaning device connectedto the coating basins in order to clean the electrolyte in the bypass inan electrolyte/solvent separation device 110. Thereby it is ensured thatno noteworthy amounts of electrolyte are carried over, whereby asubstantially closed material circuit can be produced. To clean theelectrolyte, fluid is conducted from the two coating basins 30, 31 to adistillation device 112 via lines 111. In addition to this, a condensatecollecting tank 113 is provided which is connected to the distillationdevice 112 via a line 114. The cleaned electrolyte is recycled to thecoating basin 30 via lines 115, 117 and a pump 116. The solventdistilled from the electrolyte/solvent mixture is collected in thecondensate collecting tank 113 and recycled to the rinsing bath in theoutput rinsing basin 32 via a line 118, a pump 119, and a recycling line102. Thus the rinsing bath in the output rinsing basin 32 is alwaysprovided with clean solvent. If the level in the output rinsing basinshould rise too high, an overflow line 103 is provided between theoutput rinsing basin and the second coating basin 31. Via this overflowline the excess rinsing fluid, therefore in particular solvent, runsback into the second coating basin.

Like the cleaning and/or activation section 2, the coating section 3also comprises a transport device 55 with a transport carriage 56 and ahook 57 in order to be able to transport the product 7 to be coatedbetween the individual basins of the coating section. In addition tothis, a cooling device 58 in the form of a cooling coil as well as acollecting trough as collecting device 59 for condensed solvent are alsoprovided. Via a drain line 104 the collected condensed solvent isrecycled to the first coating basin 30.

The outlet section 4 comprises the second part of the siphon rinsingdevice 61. This is, like the transport device 60, provided with atransport device 67. Via this, the products brought through the cover 64into the siphon rinsing device are transported to the section lying onthe other side of the partition 54 and having a cover 65 of the siphonrinsing device 61. The transport is done, as in the siphon rinsingdevice 60, below the surface of the rinsing fluid in the siphon rinsingdevice. Thereby an essentially complete exclusion of gas duringtransport of the products from the coating section into the outputsection is made possible.

In addition to this, the output section comprises a second sluicechamber 40 for sluicing the coated products out of the device. Thesluice chamber is provided with a cover 41. In addition to this, itcomprises a sluice door 42. Similarly to the sluice chamber 20 thesluice chamber 40 is also provided with a device 130 for the recovery ofsolvent and a gas oscillation system 140. The device for the recovery ofsolvent is also provided with a cold trap 131, a valve 132 between thesluice chamber 40 and the cold trap 131, a condensate separation device133, a line 134 between the valve 132 and the sluice chamber 40, a line135 between the condensate separation device 133 and cold trap 131, anda solvent recycling line 136 between the condensate separation device133 and the siphon rinsing device 61.

The gas oscillation system 140 comprises a vacuum pump 141, three valves142, 143, and 144 as well as several lines located between them. A firstline 145 leads from the sluice chamber 40 to the first valve 142, asecond line 146 leads from the valve 142 to the pump 141. To it, a linefrom the cold trap 131 also leads, as is also the case for the device 70between the cold trap 71 and the vacuum pump 81. From the pump 141 aline 147 leads to the valve 143 and from it a recycling line 148 leadsto the hood section 52. From the vacuum pump the line 147 also leads tothe valve 144, via which, in particular, air from the sluice chamber 40can be blown outwards into the environment via a line 149.

The hood section 52 also comprises a transport device 55 with atransport carriage 56 which comprises a hook 57 in order to graspproducts 7 and to be able to lower them into the individual basins.Likewise, cooling coils 58 are provided as a cooling device and acollecting trough 59 is provided for the condensed solvent which can berecycled from the collecting trough via a run-off line 105 to the siphonrinsing device 61.

The output section 4 is also provided with a gas buffer container 125and a line 126 between the interior of the hood section 52 and the gasbuffer container 125. With this it can be ensured that within the outputsection as constant a gas pressure as possible is maintained, although,for example, by recycling dry inert gas via the line 145 an overpressurein the hood section of the output section could occur, just as anunderpressure during flooding of the sluice chamber 40 with hoodatmosphere from the output section after the pumping out of the exterioratmosphere following a process of sluicing finished products out of thesluice chamber 40.

Specifically because of the constant opening and closing of the outputsection for the sluicing out of finished products and recycling ofpurified gas, in order to determine, and if necessary to intervene tocorrect, the oxygen and solvent content within the output section in ascontinuous a manner as possible, and thus to avoid as much as possibleany undesired solvent emission from the sluice chamber, and in order tokeep the solvent loss and also hazardous exhaust gases from the deviceas low as possible, first and second oxygen sensors 127, 128, and asolvent concentration sensor 129 are provided., The first oxygen sensor127 is provided in the upper hood section 52 while the second oxygensensor 128 and the solvent concentration sensor 129 are provided at thesluice chamber 40. Also, the hood section 51 over the coating section 3is provided with such an oxygen sensor 150.

The course of a coating with the respective regeneration steps forelectrolyte, cleaning fluid, solvent, and gas atmosphere will now bedescribed in more detail.

A product to be coated is brought into the first sluice chamber 20 viathe sluice door 28. This is done in particular via a transport carriage,which is however not represented in the figure. During the process ofsluicing in, the sluice chamber is inevitably filled with exterioratmosphere (air) and subsequently sealed. Thereafter the sluice chamberis evacuated via the vacuum pump 81 and the lines 85 and 86. For this,the valve 82 is opened. Since then only uncontaminated air is in thesluice chamber, it can be discharged outwards directly via the line 89and the opened valve 84. Subsequently, the sluice chamber is floodedwith inert gas from the hood section 50. Thereupon the inner cover 24,which is disposed between the sluice chamber and the hood section 50,can be opened and the product brought into the inert gas atmospherewithin the hood section 50. The amount of oxygen which can penetrateinto the first hood section 50 is very small since the sluice chambercan be evacuated up to a final pressure of less than 1 to 2 mbar and itis furthermore possible that intermediate rinsings with inert gas, inparticular nitrogen and argon, are performed.

The amount of gas needed for the flooding, said gas being taken from thehood section 50, would presumably lead to a lowering of the pressureunless the gas buffer container is provided. In order to avoid this andalso to prevent new inert gas, e.g. nitrogen, constantly having to bebrought into the hood section, in which in turn traces of oxygen andwater can then be found, the gas buffer container 120 is connected tothe hood section 50 which holds the pressure in the hood section 50essentially constant due to the possible change in volume.

A monitoring of the atmosphere within the hood section can be donecontinuously by means of the oxygen sensors. The solvent concentrationis monitored via the solvent concentration sensor 124. Checking theoxygen diffusion into the system is logical, in particular with regardto the service lifetime of the electrolytes and the coating quality, butalso with regard to the general reliability of processing andoperational safety of the entire system.

After the product has been brought through the cover 24 into the hoodsection 50, the cover 24 can be closed once again and the sluiceatmosphere pumped out, where an inert gas/solvent mixture is present inthe sluice atmosphere and pumped out. This is done after opening thevalve 72 via the line 74, whereby the inert gas/solvent mixture isconducted through the cold trap 71. After the condensation the dry inertgas obtained is recycled via the vacuum pump 81, the line 87, the thenopen valve 83, and the line 88 to the hood section 50. The inert gas canonce again be made available to the atmosphere in the hood section 50 ascleaned gas. The excess gas volume is collected by an increase in volumein the gas buffer container 120, whereby the pressure in the hoodsection 50 can be held essentially constant.

The accumulating condensed solvent is introduced into the condensateseparation device 73 via the line 75 and can be recycled to the firsttreatment basin 21 via the solvent recycling line 76, in particular in aperiodically recurring manner. Subsequently, the evacuated sluicechamber is once again flooded with fresh inert gas and the door to theexterior atmosphere, namely the sluice door 28, can be opened once againin order to bring new products into the device.

Via the transport device 55 the products can be brought into thetreatment basins 21, 22, which in particular contain a cleaning fluid,and can be pre-cleaned there, and in particular a blank, oxide-freesurface can be produced on them in order to ensure an optimal adhesivestrength in the subsequent coating. In addition to this, an adhesionpromoter layer can be applied there in this basin. In order toessentially avoid the evaporation of solvent, the covers 25, 26 areprovided. Likewise, the cover 27 is provided on the rinsing basins whichare each preferably only opened when goods or products are brought in orout. The rinsing basin 23 disposed behind this serves the purpose ofavoiding any carry-over of chemicals from the treatments basins 21, 22into the siphon rinsing device 60, where also the carry-over into thecoating electrolyte in the basins in the coating section should beavoided. The fluid of the rinsing basin 23 is regularly prepared via thesolvent preparation and/or regeneration device 90 which is connected inthe bypass to the cleaning and/or activation section.

After the rinsing of the pretreated product it is put into the siphonrinsing device 60 via the cover 62. Due to the partition 53 beingprovided, the two hood sections 50 and 51 lying above are separated fromone another in a gas-tight manner but are still connected to one anotherby the double rinsing basins of the siphon rinsing device 60 so thatproducts can reach through. Preferably, the fluid in the siphon rinsingdevices is identical to the solvent used in the coating electrolyte. Inorder to avoid any reaction with cleaning fluid and/or coatingelectrolyte as far as possible, an inert solvent is preferably used. Byproviding the siphon rinsing device between the activation section 2 andthe coating section 3 the advantage results that in the cleaning fluidsof the cleaning and activation section those solvents can also be usedwhich are poorly compatible with the coating electrolyte since anymigration of the solvent into the electrolyte area via the gasatmosphere is prevented. A carry-over of solvent with the products to becoated is in particular also most substantially prevented by thepreparation of the fluid of the rinsing basin 23 via the distillationdevice 91.

After lifting the products out through the cover 63 of the siphonrinsing device 60, they arrive in the coating section 3 and therein canbe lifted into the coating basins 30, 31. Along with the two coatingbasins represented in the basins, numerous additional ones can beprovided, likewise additional output rinsing basins 32, where in thefigure merely one of them is represented. In order to avoid uncontrolledevaporation of solvent in the hood section 51 lying above, the covers63, 33, 34, 35, and 64 are closed in normal operation. Preferably, thecovers are only opened to run products into, or take products out of,the individual basins.

In the two coating basins 30, 31 the cooling coils 36, 37 and thecollecting trough 38, 39 are each located in the gas space between thebath fluid level and the cover. Here solvent which is evaporated fromthe electrolyte during the coating is condensed and conducted to therinsing bath in the output rinsing basin 32. Via the distillation deviceprovided in the electrolyte circuit rather large amounts of electrolyteare regularly brought into reaction and pumped back once again to thebasin 30 via the lines provided therein as well as the pump 116. Thesolvent distilled from the electrolyte is collected in the collectingtank 113 and recycled once again to the output rinsing basin 32 or tothe rinsing bath contained therein via the lines and the pump 119. Toavoid an overflow of the output rinsing basin 32, excess solvent isrecycled into the circuit or the basin 31 via the overflow line 103.Thereby it is ensured that no noteworthy amounts of electrolyte arecarried over into the siphon rinsing device 61 disposed further on,where even at this point a substantially closed material circuit canalready be produced.

The connecting siphon rinsing device 61 between the coating section andthe output section is comparable in structure and function to the siphonrinsing device 60. The products completely immersed therein are takenout once again through the cover 65 on the side of the output section 4.Due to the previous rinsing in the output rinsing basin 32, in whichfresh solvent is contained, the electrolyte residues adhering previouslyfrom the coating section 3 are collected and not carried over into theoutput section 4. In addition to this, each of the output rinsing basinsalso serves to effectively utilize, and remove from the system, excessprocess heat which arises in the coating process.

In the output section 4 the second sluice chamber 40 is also provided,into which the coated product is brought. This is done via the cover 41.After stocking the sluice chamber with finally coated product, apumping-off process is also initiated. This serves for the recovery ofany solvent residues still adhering to the coated product. Thereby it ispossible that the completely coated product leaves the device dry andsolvent emissions essentially can take no longer place. All the solventevaporated during the pumping off process, recondensed in the cold trap131, and collected in the condensate separation device 133 is recycledinto the siphon rinsing device 61 via the line 136. Otherwise, thesluicing-out process runs analogously to the sluicing-in process withregard to pumping in and pumping out of sluice atmosphere and inert gas.For sluicing out the sluice door 42 is opened.

The individual hood sections 50, 51, and 52 are flooded with inert gasand, at least in the present embodiment example, held, via an automaticpressure maintenance system, constantly at a slight overpressure withrespect to the ambient atmosphere. Thereby any penetration of air intothe hood component is avoided. The oxygen sensors 122, 123, 127, 128,and 150 continuously specify the oxygen content in the respective gasatmosphere. If an overshoot of predefined threshold values is detected,an adaptation, with respect to the pumps 81, 141, of the pumping time isperformed or an additional rinsing with inert gas during the pumpingcycle in the sluice chambers 20, 40 is initiated.

Also, providing the siphon rinsing devices filled with a barrier fluid,in particular inert solvent, provides for an additional increase of thebarrier effect in this area, in particular in combination with thecovers 62, 63, and 64, 65, whereby an additional reduction of thediffusion of oxygen and moisture into the coating section 3 can be madepossible. The combination of sluice chambers, a vacuum system, a gasoscillation system, and the siphon rinsing devices provides for a verylong service lifetime of the metal-organic coating electrolytes and auniform coating quality since the formation of undesired reactionproducts, such as, for example, alkoxy compounds or aluminum oxanes, canbe effectively restricted or essentially prevented.

By providing a solvent preparation for the cleaning and/or activationsection 2 any contamination of the coating electrolytes by oxygen andmoisture as well as any carry-over of other chemicals can be effectivelyprevented, in particular also the carry-over of solvents used in thecleaning fluids which, in given cases, are incompatible with a certaincoating electrolyte. By providing the solvent preparation and/orregeneration device 90 direct recycling of cleaning fluid and solventinto the corresponding circuit can be made possible. Therebycontamination in the rinsing basin 23 can also be held to a very lowlevel.

By condensing the hood atmosphere in the hood sections 50, 51, 52 theycan be kept as dry and pure as possible. Also, any condensation ofsolvent residues found on the goods which evaporate during the transporttime, in particular when the products are still warm, can be condensedoff in a controlled manner and recycled once again into the individualmaterial circuits via the drain lines.

Along with the embodiment example described above and represented in thedrawing, numerous others can be formed in each of which it is possibleto hold solvent emissions from the device as low as possible and toachieve as high as possible a reduction of the carry-over of oxygen andmoisture as well as other contaminants into a coating electrolyte andthus to clearly extend the service lifetime of coating electrolyteswhile avoiding the formation of undesired reaction products. Inparticular, only one, or more than the two, treatment basins, coatingbasins, siphon rinsing devices, and rinsing basins can also be provided.Also, additional sections, in particular additional coating sections,can be provided. Also, the siphon rinsing device(s) can be replaced byanother device with corresponding action, where furthermore agas-related separation between sections of the device is made possible.In principle, it is also possible to configure the cleaning and/oractivation section to be smaller or, in given cases, to even have itomitted entirely. In any case, the devices comprise a closed hoodatmosphere which forms an essentially tight bell over the individualstations of the coating device, where at the same time there is aconstant cleaning of the atmosphere as well as the treatment or coatingbaths and rinsing baths. This can be accomplished in a particularlysimply manner by leading the cleaning sections in the bypass to therespective processing or treatment sections. Alternatively, more complexcleaning steps or circuits are possible.

List of Reference Numbers

-   1 Device-   2 Cleaning and activation section-   3 Coating section-   4 Output section-   5 Hood component-   7 Product-   20 First sluice chamber-   21 First treatment basin-   22 Second treatment basin-   23 Rinsing basin-   24 Cover-   25 Cover-   26 Cover-   27 Cover-   28 Sluice door-   29 Overflow line-   30 First coating basin-   31 Second coating basin-   32 Output rinsing device-   33 Cover-   34 Cover-   35 Cover-   36 Cooling coil-   37 Cooling coil-   38 Collecting trough-   39 Collecting trough-   40 Second sluice chamber-   41 Cover-   42 Sluice door-   50 First hood section-   51 Second hood section-   52 Third hood section-   53 Partition-   54 Partition-   55 Transport device-   56 Transport carriage-   57 Hook-   58 Cooling device-   59 Collecting device-   60 First siphon rinsing device-   61 Second siphon rinsing device-   62 Cover-   63 Cover-   64 Cover-   65 Cover-   66 Transport device-   67 Transport device-   70 Device for the recovery of solvent-   71 Cold trap-   72 Valve-   73 Condensate separation device-   74 Line-   75 Line-   76 Solvent recovery line-   80 Gas oscillation system-   81 Vacuum pump-   82 Valve-   83 Valve-   84 Valve-   85 Line-   86 Line-   87 Line-   88 Line-   89 Line-   90 Solvent preparation and/or regeneration device-   91 Distillation device-   92 Condensate collection tank-   93 Line-   94 Line-   95 Line-   96 Pump-   97 Line-   98 Line-   99 Pump-   100 Line-   101 Drain line-   102 Recycling line-   103 Overflow line-   104 Drain line-   105 Drain line-   110 Electrolyte/solvent separation device-   111 Line-   112 Distillation device-   113 Condensate collection tank-   114 Line-   115 Line-   116 Pump-   117 Line-   118 Line-   119 Pump-   120 Gas buffer container-   121 Line-   122 First oxygen sensor-   123 Second oxygen sensor-   124 Solvent concentration sensor-   125 Gas buffer container-   126 Line-   127 First oxygen sensor-   128 Second oxygen sensor-   129 Solvent concentration sensor-   130 Device for the recovery of solvent-   131 Cold trap-   132 Valve-   133 Condensate separation device-   134 Line-   135 Line-   136 Solvent recycling line-   140 Gas oscillation system-   141 Vacuum pump-   142 Valve-   143 Valve-   144 Valve-   145 Line-   146 Line-   147 Line-   148 Line-   149 Line-   150 Oxygen sensor

1. Device for depositing metals and/or metal alloys from metal-organicelectrolytes, in particular metal-organic complex salts in organicsolvents, onto products, said device comprising at least one coatingsection for coating the products, at least one additional processingsection, and at least one sluice chamber for sluicing the products intoand out of the device essentially without oxygen and/or moisturepenetrating, wherein at least one siphon rinsing device with aseparating device for gas-related separation of the other sections ofthe device from, or sealing of, these other sections with respect to thecoating section and at least one hood component which can be floodedwith inert gas and essentially tightly encloses the coating section, theat least one siphon rinsing device, and the at least one additionalcoating section.
 2. Device according to claim 1, wherein at least onetransport device is disposed, or can be disposed, within the siphonrinsing device for traversing the products below the partition so thatduring the filling of the siphon rinsing device with a rinsing fluid thetransport device is positioned below the level of the fluid.
 3. Deviceaccording to claim 1, wherein at least one oxygen monitoring device isprovided in the at least one sluice chamber and/or the sections of thehood component and/or at least one device for monitoring the solventconcentration is provided in the sluice chambers.
 4. Device according toclaim 3, wherein on overshoot of threshold values which can be set, orare set, the at least one oxygen monitoring device triggers anadaptation of the pumping times to the introduction of gas into anddischarge of gas from the sluice chamber and/or an additional rinsingphase with an inert gas during pumping cycles to reduce the oxygencontent in the at least one sluice chamber.
 5. Device according to claim1, wherein at least one pressure maintenance device for maintaining aconstant pressure in the hood component and/or a slight overpressure inthe hood component with respect to the outer or ambient atmosphere isprovided, in particular to maintain an essentially constant pressure inthe hood component and/or hood sections at least one gas buffer deviceis provided and is connected, or can be connected, to it/them, inparticular in the first and/or last section of the device.
 6. Deviceaccording to claim 1, wherein at least one cleaning and/or activationsection for cleaning and/or pre-treating the surface of the products isprovided.
 7. Device according to claim 6, wherein the at least onecleaning and/or activation section comprises one or more sealabletreatment basins with a cleaning fluid for cleaning the products to becoated and/or an activation fluid for activating their surfaces, inparticular for producing an adhesion promoter layer and/or the at leastone cleaning and/or activation section comprises at least one rinsingdevice disposed after the at least one treatment basin for rinsing thepretreated products and preventing any carry-over of chemicals from thecleaning and/or activation section.
 8. Device according to claim 1,wherein the at least one coating section comprises at least one coatingbasin which can be sealed to prevent uncontrolled evaporation of solventinto the hood component and/or at least one output rinsing basin forrinsing the coated products.
 9. Device according to claim 1, wherein atleast one solvent preparation and/or regeneration device is provided, inparticular the at least one solvent preparation device for the at leastone cleaning and/or activation section is provided in the bypass to it.10. Device according to claim 1, wherein the at least one sluice chamberis connected, or can be connected, to a solvent separation and recyclingdevice and/or a gas oscillation system.
 11. Device according to claim 1,wherein at least one cooling device with a condensate separation devicefor the recovery of carried-over and/or evaporated solvent residues isprovided, in particular in the hood component and/or coating sectionand/or connected to the at least one sluicing chamber.
 12. Deviceaccording to claim 11, wherein the one or more cooling devices in thehood sections and/or in the hood component comprise solvent recyclingdevices for recycling solvents into treatment and/or coating basinsand/or which comprise at least one siphon rinsing device, in particularwhich comprise at least one cooling device for condensing evaporatedsolvent and at least one collection device for collecting the condensedsolvent in the gas space of the at least one coating basin are provided.13. Device according to claim 1, wherein at least oneelectrolyte/solvent separating device is provided in the area of thecoating section, in particular the electrolyte/solvent separatingdevice(s) comprise(s) a distillation device for distilling solvent fromthe electrolyte/solvent bath fluid drained from the at least one coatingbasin and in particular devices for recycling the clean solvent obtainedinto an output rinsing basin are provided.
 14. Device according to claim1, wherein at least one sluice chamber is provided at the entrance ofthe cleaning and/or activation section and/or at least one sluicechamber is provided at the exit of the output section for the sluicingout of products.
 15. Device (1) according to claim 1, wherein the hoodcomponent (5) comprises at least one transport device for traversing theproducts between individual basins and devices.
 16. Device (1) accordingto claim 1, wherein the at least one siphon rinsing device is filledwith an inert solvent.
 17. Process for depositing metals and/or metalalloys from metal-organic electrolytes, in particular metal-organiccomplex salts in organic solvents, onto products, said methodcomprising: essentially solvent-free sluicing of the products through atleast one sluice chamber into a device to deposit metals and/or metalalloys, transferring the products to at least one coating sectionessentially excluding gas, coating the products in the at least onecoating section, transferring the coated products from the coatingsection via at least one siphon rinsing device to at least one outputsection essentially excluding gas, and sluicing out the finishedproducts via at least one additional sluice chamber, where an inert gasatmosphere bell is held up over all the sections of the device. 18.Process according to claim 17, wherein the products are pre-treated, inparticular their surfaces are cleaned and/or activated for furthertreatment.
 19. Process according to claim 18, wherein after the cleaningand/or the activation, the products are introduced via at least oneadditional siphon rinsing device essentially excluding gas into the atleast one coating section.
 20. Process according to claim 17, whereinelectrolyte fluid and/or solvents is/are conducted in essentially closedcircuits, in particular there is cleaning or preparation of electrolytefluid and/or solvent and/or a rinsing fluid to avoid any carry-over ofchemicals.
 21. Process according to claim 17, wherein to avoid anycarry-over of cleaning fluid and/or activation fluid and/or electrolytefluid adhering to the products, they are rinsed in rinsing devices. 22.Process according to claim 17, wherein in the sluicing-in step theproducts are introduced into the at least one sluice chamber, the sluicechamber is filled with the exterior atmosphere, sealed, and subsequentlyevacuated, the exterior atmosphere is conveyed out of the chamber, thechamber is subsequently flooded with inert gas, and subsequently theproducts are brought into a first treatment section of the device. 23.Process according to claim 22, wherein the pumped-out sluice atmosphereis prepared, where dry inert gas and cleaned solvent are recycled intothe process, in particular dry inert gas into the inert gas atmospherebell and cleaned solvent into a first treatment basin.
 24. Processaccording to claim 17, wherein the at least one sluice chamberatmosphere is monitored with regard to its oxygen and/or solvent contentand/or the inert gas atmosphere bell is monitored with regard to itsoxygen content, in particular on overshoot of set threshold values thedischarge of contaminated atmosphere and/or introduction of cleanedinert gas atmosphere is accelerated or decelerated.
 25. Processaccording to claim 17, wherein the gas of the inert gas atmosphere bellis also cleaned, in particular by condensing the gases and recycling thecondensed-off solvent portions into their respective material circuits.